PARTICIPATION SEARCH - ORGANISATIONS WILLING TO JOIN A CATRENE PROJECT

List of organisations

Number of requests: 19
Organisation Name Type Country Expertise area Email Record
Acreo ABInstitute
Sweden
RF, mixed-signal, analog, RFIC, antenna2012-01-31
Ms.Large Company
Turkey
Integrated Circuit Design, Analog, RF,2011-12-27
Fraunhofer IMSInstitute
Germany
CMOS fabrication, Image Sensors,CMOS process development, More-than-Moore, Optoelectronic devices 2011-07-22
Coupling Wave Solution. www.cwseda.comSME
France
Noise, substrat, interconexion, package2011-03-01
ACMLSME
France
components, models, automatization,components libraries2011-03-01
Navtel SystemsSME
France
signal processing, Digital Communication, HW/SW Prototyping, wireless systems, embedded systems2011-02-02
Technological Educational Institute of EpirusUniversity
Greece
2010-07-15
T.C. Maltepe UniversityUniversity
Turkey
UHF RFiD, HBT, III-V Semiconductors, Antenna, RF Microelectronics2010-06-16
Asst. Prof. Dr.University
Turkey
UHF RFiD, HBT, III-V Semiconductors, Antenna, RF Microelectronics2010-06-16
SI-FORM CONSULTING SME
Italy
TECHNOLOGY, URBAN.MOBILITY, DIGITALIZATION, VEHICLES.DATABASE 2010-03-26
University of SalernoUniversity
Italy
robust design, electromagnetism, tolerance analysis, carbon nanotube, nanointerconnect2010-03-15
Nanotechnology Research CentreInstitute
Turkey
Analogue, RF, integrated circuit design2010-02-08
University of CambridgeUniversity
United Kingdom
Molecular electronics, scanning probe microscopy, nanomagnetism, nanoferroelectrics2010-02-08
FUNDACIÓN TEKNIKERInstitute
Spain
biosensors, nanoimprint lithography, smart sensors, organic lasers2010-02-04
Think Silicon LtdSME
Greece
graphics, rendering, multimedia, vector, display2010-02-03
MrsInstitute
Spain
Trust, Security, Dependability, SOA, TPM2010-02-03
University Bremen
Germany
communications algorithms implementation, VLSI design2009-09-16
Universidad Rovira i VirgiliUniversity
Spain
Dynamic reconfiguration, FPGA, biometrics coprocessors2009-07-28
TOPPAN PHOTOMASKSLarge Company
France
lithography, photomask, EDA, NIL, MEMS2009-06-02