CA1 - High quality, high speed user-centred communications systems
CA2 - Smart-card systems, trusted platforms and secure applications
CA3 - Electronics in transportation for safety and security, environmental protection and communications
CA4 - Healthcare devices and systems
CA5 - Energy-efficient devices and energy control systems
CA6 - Devices and systems for digital entertainment
Technologies:
CT1 - Electronic design automation for advanced SoC and SiP design
CT2 - Process development: including next generation CMOS process (more Moore), process options (more than Moore) and heterogeneous systems integration
CT3 - Manufacturing science: cross-cutting technologies, equipment and materials
CT4 - Smart sensor and actuator systems
Expertise
Key words:
lithography, photomask, EDA, NIL, MEMS
Detailed description:
Toppan Photomasks was formed in 2005, when Toppan Printing Co., Ltd. acquired DuPont Photomasks, Inc. The combination of Toppan Photomasks with the photomask business of Toppan Printing forms the world's premier photomask provider. Toppan Photomasks offers a comprehensive range of photomask technologies, and research and development capabilities, as well as the most advanced and largest network of manufacturing facilities in the industry. In Europe Toppan Photomasks is operating strategically located manufacturing facilities and R&D centres in Germany and France. Toppan Photomasks has participated to several Europe cooperative projects and currently leads one of them. Toppan Photomasks management and team of engineers are willing to contribute to projects strengthening Europe technologies and applications. In the field of technology our key focus and expertises are lithography techniques, contamination control, metrology, material science and Data management. Photomask industry is connecting the virtual world of design and physical worlds of CMOS, MEMS/NEMS and Microsystems: Therefore we are also engaged in application projects where Supply Chain integration is requested. For example to set up innovating links between EDA and Lithography, optimise Cycle Time/Time to Market issues or provide Security expertise. For more general information, visit www.photomask.com , for detailed information contact michel.tissier@photomask.com
France
